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UV Industrial Cleaning Lamp
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UV Industrial Cleaning Lamp

Product Introduction

Mainly used in the semiconductor industry. Using the wavelength of ultraviolet light to clean the surface of the object to clean carbon and organic pollutants. The wavelength is usually in the range of 100nm~400nm. But at present, 185nm and 253.7nm are generally used as the main cleaning bands.
Features
★ Use a non-contact method to let the light source irradiate in the air to clean the pollutants.
★ There is no need for any follow-up treatment of chemical residues, which is more environmentally friendly.
★ Irradiate and clean the surface evenly and consistently.
Specification
Diameter (mm) Lamp voltage (V) Tube current (mA) Power (W) Length (mm) Shape Wavelength (nm)
17.5 100 400 40W 280 S, M, L, W/ Customization 185nm or 253.7nm/ Customization
17.5 120 850 100W 550
17.5 160 1300 200W 850
Customization
Application
Wafer/driver IC amnestic, wafer cleaning, modification, liquid crystal display, semiconductor silicon wafer, integrated circuit, high-precision printed circuit board, optical device, quartz crystal, sealing technology and fine metal material with oxide film etc production process.
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